METHOD OF PROCESSING SUBSTRATE HOLDER MATERIAL AS

专利名称：METHOD OF PROCESSING SUBSTRATE

HOLDER MATERIAL AS WELL AS SUBSTRATEHOLDER PROCESSED BY SUCH METHOD

发明人：Marcus Gerardus Van Munster,Wilhelmus

Johannes Mattheus Van Velzen,JohannesLeonardus Lamberdina Van Der Heijden

申请号：US13365665申请日：20120203

公开号：US20120199063A1公开日：20120809

专利附图：

摘要：A method is provided of processing substrate holder material for a substrateholder on which on a first side of said substrate holder a semiconductor substrate is tobe placed for layered deposition of various semiconductor materials on the

semiconductor substrate using induction heating. The method includes the operations ofdetermining a first electrical resistivity at at least one measuring position on saidsubstrate holder material, comparing said first electrical resistivity with a secondreference electrical resistivity and adapting said substrate holder material incorrespondence with said comparison. Also a substrate holder is provided which isprocesses by such a method.

申请人：Marcus Gerardus Van Munster,Wilhelmus Johannes Mattheus VanVelzen,Johannes Leonardus Lamberdina Van Der Heijden

地址：Tilburg NL,Eindhoven NL,Beek En Donk NL

国籍：NL,NL,NL

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