专利名称：Composition for forming silica based coating
film, silica based coating film and method forpreparation thereof, and electronic parts
发明人：Haruaki Sakurai,Koichi Abe,Kazuhiro
Enomoto,Shigeru Nobe
申请号：US11040119申请日：20050124公开号：US07682701B2公开日：20100323
摘要：The composition for forming silica based coating of the invention comprisessiloxane resin such as an alkoxysilane as component (a), a solvent such as an alcoholcapable of dissolving the siloxane resin as component (b), an ammonium salt, etc. ascomponent (c) and a thermal decomposing/volatile compound as component (d), whereinthe stress of the coating obtained by heat treatment at 150° C./3 min is 10 MPa and thespecific permittivity of the silica based coating obtained by final curing is less than 3.0. Thecomposition for forming silica based coating according to the invention can form a silicabased coating having low permittivity, excellent adhesion and sufficient mechanicalstrength.
申请人：Haruaki Sakurai,Koichi Abe,Kazuhiro Enomoto,Shigeru Nobe
地址：Hitachi JP,Hitachi JP,Hitachi JP,Hitachi JP
国籍：JP,JP,JP,JP
代理机构：Westerman, Hattori, Daniels & Adrian, LLP
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